Archive for ‘October, 2009’

Fast scanning of nanolithography pattern on Ti film, 3×3 microns

Local anodic oxidation on Ti film using the vector SPM nanolithography technique. Image size 3×3 µm, line height 3 nm, 400×400 points.

The scanning rate is changing from 40 Hz down to 5 Hz!

Please take a chance and meet us at AVS 56 International Symposium & Exhibition in San Jose Convention Center, November 8 – 13, 2009!

Our booth is #821.

The 2nd Nanotechnology International Forum, October 6 – 8, 2009, Moscow, Central Exhibition Complex “Expocentre”.

We would be pleased to meet you there at our booth C05!