CombiScope Specifications

Measuring Modes

• Contact AFM in air/(liquid optional);
• Semicontact AFM in air/(liquid optional);
• True Non-contact AFM;
• Phase Imaging;
• Lateral Force Microscopy (LFM);
• Force Modulation;
• Conductive AFM (optional);
• Magnetic Force Microscopy (MFM);
• Kelvin Probe (Surface Potential Microscopy);
• Capacitance and Electric Force Microscopy (EFM);
• Force curve measurements;
• Piezo Response Force Microscopy;
• Nanolithography;
• Nanomanipulation;
• STM (optional)
• Photocurrent Mapping (optional);
• Volt-ampere characteristic measurements (optional);

Scanner

• Scanning range: 100um x 100um x 20um (+/-10%);
• Optional scanning range: 200um x 200um x 20um (+/-10%);
• Scanning type: by sample;
• XY non-linearity: 0.05%;
• Z non-linearity: 0.05%;
• Noise:

-       0.1nm RMS in XY dimension in 100Hz bandwidth with capacitance sensors on;

-       0.02nm RMS in XY dimension in 100Hz bandwidth with capacitance sensors off;

-       <0.1nm RMS Z capacitance sensor in 1000Hz bandwidth;

• Digital closed loop control: for X, Y, Z axes;
• Active elimination of XY phase lag, overshooting and ringing results in fast scanning without any dynamic image distortion;

Base

• Manual sample positioning: range 25x25mm, positioning resolution 1um;
• Motorized SPM measuring head positioning: 1.6×1.6mm, positioning resolution 1um;
• Motorized approach 1.3 mm;
• Sample holder for standard slides and cover glasses;
• Optional sample holders:

-       Maximum sample size: 50.8×50.8 mm, 5 mm height with capability to choose measuring area 25x25mm in any quadrant of 50.8×50.8 mm area or in center of sample;

-       Maximum sample size: up to 100 mm width, more than 100 mm length and up to 15 mm height with capability to choose measuring area 25x25mm in any part of centre cross with width 25 mm.

AFM Head HE001

• Laser wavelength: 1300nm;
• No registration  laser influence on biological sample;
• No registration  laser influence on photovoltaic measurements;
• Registration system noise: <0.03nm.
• Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
• Free access to the probe for additional external manipulators and probes;
• Top and side simultaneous optical access with planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively).

AFM Head HE002*

• Laser wavelength: 1300nm;
• No registration  laser influence on biological sample;
• No registration  laser influence on photovoltaic measurements;
• Registration system noise: <0.1nm;
• Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
• Free access to the probe for additional external manipulators and probes;
• Top and side simultaneous optical access with planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively).

Liquid cell (optional)

• Fixing of Petri dish 35mm diameter;
• Sample positioning range 10x10mm;
• Positioning resolution 1um;
• Volume of liquid 3ml;
• Capability of liquid exchange;
• Autoclave and ultrasonic cleaning of cell parts.

Liquid cell with temperature control (optional)

• Fixing of Petri dish 35mm diameter;
• Heating up to 60°C;
• Cooling below room temperature down to 5°C;
• Sample positioning range 5x5mm;
• Positioning resolution 1um;
• Volume of liquid 3ml;
• Capability of liquid exchange;
• Autoclave and ultrasonic cleaning of cell parts.

Conductive AFM unit (optional)

• Current range 100fA ÷ 10uA;
• 3 current ranges (1nA, 100na and 10uA) switchable from program;
• Conductive to Kelvin mode switchable from program.

Optical access

• With AFM head HE001:
• Capability to use simultaneously top and side planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively);
• Field of view: from 900μm to 140μm;
• Optical resolution: 1μm;
• Bottom optical access with dry and immersion objective;

• With AFM head HE002:
• Capability to use simultaneously top and side planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively);
• Field of view: from 100μm to 50μm;
• Optical resolution: 0,4μm;
• Maximum side planapochromat objectives 20x, NA=0.42;
• Bottom optical access with dry and immersion objective;

Compatibility with inverted optical microscopes

• No interference with optical imaging due to infrared laser;
• Capability to install on:

-       Nikon Ti-E, Ti-U, Ti-S, TE2000;

-       Olympus IX-71, IX-81;

• Phase contrast, DIC and fluorescent techniques with native optical condenser;
• Upgradeability to OmegaScope for spectroscopic and TERS operation.

Optical microscope for standalone operation (optional)

• Numerical aperture: up to 0.1;
• Magnification on 19″ monitor with 1/3″ CCD: from 85x to 1050x.
• Horizontal field of view: from 4.5 to 0.37 mm
• Manual detent zoom 12.5x (motorized zoom optional)
• Stand and coarse/fine focusing unit.;
• Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head);
• Capability to use M Plan Apo objective: 10x, NA = 0.28.
• Magnification on 19″ monitor with 1/3″ CCD: 400x to 5300x
• Horizontal field of view: from 0.96 to 0.07 mm.
• Resolution: up to 1 um.

Vibration isolation

• Isolation: dynamic 0.7Hz to 1kHz, purely passive beyond 1kHz;
• Maximum load: 150kg;
• Size: 400x450x75mm (WxDxH).

Controller electronics

• Modular fully digital expandable controller;
• High speed DSP 190 MHz;
• USB 2.0 interface;
• High speed 500 kHz 18-bit ADC, 20 channels;
• 5 MHz frequency range registration system;
• 2 lock-in amplifiers with 5 MHz frequency range;
• 6 digital 32–bit generators 5 MHz frequency range, 0.01 Hz resolution;
• Software controlled modulation possibilities for probe, X, Y and Z scanners, Bias voltage and two external outputs;
• HV amplifiers  -5 … +120v, 0.4 ppm HV noise ;
• AC, DC Bias Voltage -10 … +10v, 2 MHz frequency range;
• 7 stepper motors control;
• Digital inputs/outputs for integration with external equipment,
• Analog input/outputs for integration with external equipment.

Software

• Automatic alignment of registration system;
• Automatic configuration and presetting for standard measuring techniques;
• Automatic cantilever resonance frequency adjustment;
• Capability to work with force curves;
• Macro language Lua for programming user functions, scripts and widgets;
• Capability to program controller with DSP macro language in real time without reloading control software;
• Capability to process images in coordinate space including making cross-sections, fitting and polynomial smoothing up to 8 degree;
• FFT processing with capability to treat images in frequency space including filtration and analysis;
• Nanolithography and nanomanipulation;
• Processing up to 5000×5000 pixel images.

Computer

• High performance computer with Windows XP operating system, Intel Core 2 Duo, 1GB RAM, 500GB HDD, DVD R/W,  two 19 inch LCD monitors, s-video capture card.

Specifications are subject to change without notice.