CombiScope Specifications

Measuring Modes

• Contact AFM in air/(liquid optional);
• Semicontact AFM in air/(liquid optional);
• True Non-contact AFM;
• Phase Imaging;
• Lateral Force Microscopy (LFM);
• Force Modulation;
• Conductive AFM (optional);
• Magnetic Force Microscopy (MFM);
• Kelvin Probe (Surface Potential Microscopy);
• Capacitance and Electric Force Microscopy (EFM);
• Force curve measurements;
• Piezo Response Force Microscopy;
• Nanolithography;
• Nanomanipulation;
• STM (optional)
• Photocurrent Mapping (optional);
• Volt-ampere characteristic measurements (optional);

Scanner

• Scanning range: 100um x 100um x 20um (+/-10%);
• Optional scanning range: 200um x 200um x 20um (+/-10%);
• Scanning type: by sample;
• XY non-linearity: 0.05%;
• Z non-linearity: 0.05%;
• Noise:

-       0.1nm RMS in XY dimension in 100Hz bandwidth with capacitance sensors on;

-       0.02nm RMS in XY dimension in 100Hz bandwidth with capacitance sensors off;

-       <0.1nm RMS Z capacitance sensor in 1000Hz bandwidth;

• Digital closed loop control: for X, Y, Z axes;
• Active elimination of XY phase lag, overshooting and ringing results in fast scanning without any dynamic image distortion;

Base

• Manual sample positioning: range 25×25mm, positioning resolution 1um;
• Motorized SPM measuring head positioning: 1.6×1.6mm, positioning resolution 1um;
• Motorized approach 1.3 mm;
• Sample holder for standard slides and cover glasses;
• Optional sample holders:

-       Maximum sample size: 50.8×50.8 mm, 5 mm height with capability to choose measuring area 25×25mm in any quadrant of 50.8×50.8 mm area or in center of sample;

-       Maximum sample size: up to 100 mm width, more than 100 mm length and up to 15 mm height with capability to choose measuring area 25×25mm in any part of centre cross with width 25 mm.

AFM Head HE001

• Laser wavelength: 1300nm;
• No registration  laser influence on biological sample;
• No registration  laser influence on photovoltaic measurements;
• Registration system noise: <0.03nm.
• Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
• Free access to the probe for additional external manipulators and probes;
• Top and side simultaneous optical access with planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively).

AFM Head HE002*

• Laser wavelength: 1300nm;
• No registration  laser influence on biological sample;
• No registration  laser influence on photovoltaic measurements;
• Registration system noise: <0.1nm;
• Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
• Free access to the probe for additional external manipulators and probes;
• Top and side simultaneous optical access with planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively).

Liquid cell (optional)

• Fixing of Petri dish 35mm diameter;
• Sample positioning range 10×10mm;
• Positioning resolution 1um;
• Volume of liquid 3ml;
• Capability of liquid exchange;
• Autoclave and ultrasonic cleaning of cell parts.

Liquid cell with temperature control (optional)

• Fixing of Petri dish 35mm diameter;
• Heating up to 60°C;
• Cooling below room temperature down to 5°C;
• Sample positioning range 5×5mm;
• Positioning resolution 1um;
• Volume of liquid 3ml;
• Capability of liquid exchange;
• Autoclave and ultrasonic cleaning of cell parts.

Conductive AFM unit (optional)

• Current range 100fA ÷ 10uA;
• 3 current ranges (1nA, 100na and 10uA) switchable from program;
• Conductive to Kelvin mode switchable from program.

Optical access

• With AFM head HE001:
• Capability to use simultaneously top and side planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively);
• Field of view: from 900μm to 140μm;
• Optical resolution: 1μm;
• Bottom optical access with dry and immersion objective;

• With AFM head HE002:
• Capability to use simultaneously top and side planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively);
• Field of view: from 100μm to 50μm;
• Optical resolution: 0,4μm;
• Maximum side planapochromat objectives 20x, NA=0.42;
• Bottom optical access with dry and immersion objective;

Compatibility with inverted optical microscopes

• No interference with optical imaging due to infrared laser;
• Capability to install on:

-       Nikon Ti-E, Ti-U, Ti-S, TE2000;

-       Olympus IX-71, IX-81;

• Phase contrast, DIC and fluorescent techniques with native optical condenser;
• Upgradeability to OmegaScope for spectroscopic and TERS operation.

Optical microscope for standalone operation (optional)

• Numerical aperture: up to 0.1;
• Magnification on 19″ monitor with 1/3″ CCD: from 85x to 1050x.
• Horizontal field of view: from 4.5 to 0.37 mm
• Manual detent zoom 12.5x (motorized zoom optional)
• Stand and coarse/fine focusing unit.;
• Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head);
• Capability to use M Plan Apo objective: 10x, NA = 0.28.
• Magnification on 19″ monitor with 1/3″ CCD: 400x to 5300x
• Horizontal field of view: from 0.96 to 0.07 mm.
• Resolution: up to 1 um.

Vibration isolation

• Isolation: dynamic 0.7Hz to 1kHz, purely passive beyond 1kHz;
• Maximum load: 150kg;
• Size: 400×450x75mm (WxDxH).

Controller electronics

• Modular fully digital expandable controller;
• High speed DSP 190 MHz;
• USB 2.0 interface;
• High speed 500 kHz 18-bit ADC, 20 channels;
• 5 MHz frequency range registration system;
• 2 lock-in amplifiers with 5 MHz frequency range;
• 6 digital 32–bit generators 5 MHz frequency range, 0.01 Hz resolution;
• Software controlled modulation possibilities for probe, X, Y and Z scanners, Bias voltage and two external outputs;
• HV amplifiers  -5 … +120v, 0.4 ppm HV noise ;
• AC, DC Bias Voltage -10 … +10v, 2 MHz frequency range;
• 7 stepper motors control;
• Digital inputs/outputs for integration with external equipment,
• Analog input/outputs for integration with external equipment.

Software

• Automatic alignment of registration system;
• Automatic configuration and presetting for standard measuring techniques;
• Automatic cantilever resonance frequency adjustment;
• Capability to work with force curves;
• Macro language Lua for programming user functions, scripts and widgets;
• Capability to program controller with DSP macro language in real time without reloading control software;
• Capability to process images in coordinate space including making cross-sections, fitting and polynomial smoothing up to 8 degree;
• FFT processing with capability to treat images in frequency space including filtration and analysis;
• Nanolithography and nanomanipulation;
• Processing up to 5000×5000 pixel images.

Computer

• High performance computer with Windows XP operating system, Intel Core 2 Duo, 1GB RAM, 500GB HDD, DVD R/W,  two 19 inch LCD monitors, s-video capture card.

Specifications are subject to change without notice.