SmartSPM™ specifications

Measuring Modes

  • Contact AFM in air/(liquid optional);
  • Semicontact AFM in air/(liquid optional);
  • True Non-contact AFM;
  • Phase Imaging;
  • Lateral Force Microscopy (LFM);
  • Force Modulation;
  • Conductive AFM (optional);
  • Magnetic Force Microscopy (MFM);
  • Kelvin Probe (Surface Potential Microscopy);
  • Capacitance and Electric Force Microscopy (EFM);
  • Force curve measurements;
  • Piezo Response Force Microscopy;
  • Nanolithography;
  • Nanomanipulation;
  • STM (optional);
  • Photocurrent Mapping (optional);
  • Volt-ampere characteristic measurements (optional).

Scanner and Base

  • Scanning range 100um x 100um x 15um (+/-10%);
  • Scanning type by sample;
  • XY non-linearity 0.05%;
  • Z non-linearity 0.05%;
  • Noise:

   -     0.1nm RMS in XY dimension in 200Hz bandwidth with capacitance sensors on;

   -     0.02nm RMS in XY dimension in 100Hz bandwidth with capacitance sensors off;

   -     <0.04nm RMS Z capacitance sensor in 1000Hz bandwidth;

  • XY resonance frequency 7 kHz (unloaded);
  • Z resonance frequency 15 kHz (unloaded);
  • Digital closed loop control for X, Y, Z axes;
  • Active elimination of XY phase lag, overshooting and ringing results in fast scanning without any dynamic image distortion;
  • Motorized approach range 18 mm;
  • Maximum sample size: 40x50 mm, 15 mm thickness;
  • Motorized sample positioning range5x5mm,
  • Positioning resolution 1um.

AFM Head HE001

  • Laser wavelength 1300nm;
  • No registration  laser influence on biological sample;
  • No registration  laser influence on photovoltaic measurements;
  • Registration system noise <0.03nm.
  • Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
  • Free access to the probe for additional external manipulators and probes;
  • Top and side simultaneous optical access with planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively).

AFM Head HE002*

  • Laser wavelength 1300nm;
  • No registration  laser influence on biological sample;
  • No registration  laser influence on photovoltaic measurements;
  • Registration system noise <0.1nm;
  • Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;
  • Free access to the probe for additional external manipulators and probes;
  • Top and side simultaneous optical access with planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively).

Liquid cell (optional)

  • Sample size 2mm thickness, 25mm diameter;
  • Sample positioning range 5x5mm;
  • Positioning resolution 1um;
  • Cell size 40x40x12mm;
  • Volume of liquid 3ml;
  • Capability of liquid exchange;
  • Autoclave and ultrasonic cleaning of cell parts.

Liquid cell with temperature control (optional)

  • Sample size 2mm thickness, 25mm diameter;
  • Heating up to 60°C;
  • Cooling below room temperature down to 5°C;
  • Sample positioning range 5x5mm;
  • Positioning resolution 1um;
  • Cell size 40x40x12mm;
  • Volume of liquid 3ml;
  • Capability of liquid exchange;
  • Autoclave and ultrasonic cleaning of cell parts.

Conductive AFM unit (optional)

  • Current range 100fA ? 10uA;
  • 3 current ranges (1nA, 100na and 10uA) switchable from the software;
  • Conductive AFM to Kelvin Probe mode switchable from the software.

Optical access

  • With AFM head HE001:
  • Capability to use simultaneously top and side planapochromat objectives (10x, NA=0.28 and 20x, NA=0.42 respectively);
  • Field of view from 900?m to 140?m;
  • Optical resolution: 1?m;
  • With AFM head HE002:
  • Capability to use simultaneously top and side planapochromat objectives (100x, NA=0.7 and 10x, NA=0.28 respectively);
  • Field of view from 100?m to 50?m;
  • Optical resolution: 0,4?m;
  • Maximum side planapochromat objectives 20x, NA=0.42;

Compatibility with optical systems

  • No interference with optical imaging due to infrared laser;
  • Upgradeability to OmegaScope for spectroscopic and TERS operation.
  • Optional XYZ positioning system SPS002 for probe tip alignment in objective focus

   -     Manual positioning range 2x2x2 mm;

   -     Piezo positioning range 10x10x10 um, capacitive sensors.

Optical microscope (optional)

  • Numerical aperture up to 0.1;
  • Magnification on 19" monitor with 1/3" CCD from 85x to 1050x;
  • Horizontal field of view from 4.5 to 0.37 mm;
  • Manual detent zoom 12.5x (motorized zoom optional);
  • Stand and coarse/fine focusing unit;
  • Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head);
  • Capability to use M Plan Apo objective 10x, NA = 0.28;
  • Magnification on 19" monitor with 1/3" CCD: 400x to 5300x;
  • Horizontal field of view from 0.96 to 0.07 mm;
  • Resolution up to 1 um.

Vibration isolation (optional)

  • Isolation: dynamic 0.7Hz to 1kHz, purely passive beyond 1kHz;
  • Maximum load: 150kg;
  • Size: 400x450x75mm (WxDxH).

Controller electronics

  • Modular fully digital expandable controller;
  • High speed DSP 300 MHz;
  • USB 2.0 interface;
  • High speed 500 kHz 18-bit ADC, 20 channels;
  • 5 MHz frequency range registration system;
  • 2 lock-in amplifiers with 5 MHz frequency range;
  • 6 digital 32–bit generators 5 MHz frequency range, 0.01 Hz resolution;
  • Software controlled modulation possibilities for probe, X, Y and Z scanners, Bias voltage and two external outputs;
  • HV amplifiers  -5 … +120v, 0.4 ppm HV noise;
  • AC, DC Bias Voltage -10 … +10v, 2 MHz frequency range;
  • 7 stepper motors control;
  • Digital inputs/outputs for integration with external equipment,
  • Analog input/outputs for integration with external equipment.

Software

  • Automatic alignment of registration system;
  • Automatic configuration and presetting for standard measuring techniques;
  • Automatic cantilever resonance frequency adjustment;
  • Capability to work with force curves;
  • Macro language Lua for programming user functions, scripts and widgets;
  • Capability to program controller with DSP macro language in real time without reloading control software;
  • Capability to process images in coordinate space including making cross-sections, fitting and polynomial smoothing up to 8 degree;
  • FFT processing with capability to treat images in frequency space including filtration and analysis;
  • Nanolithography and nanomanipulation;
  • Processing up to 5000x5000 pixel images.

Specifications are subject to change without notice.